The patent, which was submitted by SMEE in March 2023, focuses on 'extreme ultraviolet (EUV) radiation generators and lithography equipment.' Based on the SCMP's description, SMEE is attempting to ...
The "extreme ultraviolet [EUV] radiation generators and lithography equipment" patent, filed in March 2023, was published publicly on Tuesday and is still being vetted by the China National ...
Three detainees broke out of a custodial facility in Taytay, Rizal amid the bad weather caused by Tropical Storm Enteng, a duty jail officer discovered early Tuesday morning. A report from Police ...
The new facility, to be built in three to five years, will feature extreme ultraviolet lithography (EUV) equipment. Manufacturers of equipment and materials companies will pay a fee to use the ...